Excimer laser photochemistry of lithographic systems
- 1 May 1988
- journal article
- Published by Wiley in Makromolekulare Chemie. Macromolecular Symposia
- Vol. 18 (1) , 145-156
- https://doi.org/10.1002/masy.19880180114
Abstract
No abstract availableFunding Information
- Central Department of Optics and Spectroscopy, the VEB Fotochemische Werke Berlin
- Tokai University, Hiratsuka, for successful cooperation
This publication has 20 references indexed in Scilit:
- Advances In Excimer Laser LithographyPublished by SPIE-Intl Soc Optical Eng ,1987
- Laser in der Chemie – wo stehen wir heute?Angewandte Chemie, 1987
- Negativ-Photoresist für den nahen UV-BereichZeitschrift für Chemie, 1986
- Scanning Laser Technology Applied to High Speed Reticle WritingPublished by SPIE-Intl Soc Optical Eng ,1986
- Resists For Use In 248 Nm Excimer Laser LithographyPublished by SPIE-Intl Soc Optical Eng ,1986
- Velocity distribution of molecular fragments from polymethylmethacrylate irradiated with UV laser pulsesApplied Physics Letters, 1986
- Intermolekulare Wechselwirkung der photolithographisch genutzten Sensibilisatorkombination Erythrosin/N‐Phenylthio‐acridonZeitschrift für Chemie, 1985
- Kinetics of the ablative photodecomposition of organic polymers in the far ultraviolet (193 nm)Journal of Vacuum Science & Technology B, 1983
- Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laserApplied Physics Letters, 1982
- STUDIES OF PHOTOSENSITIVE RESINS V. THE PHOTO-DECOMPOSITION MECHANISM OF O-NAPHTHOQUINONE DIAZIDESChemistry Letters, 1972