Nano-fabrication with focused ion beams
- 30 September 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 57-58, 865-875
- https://doi.org/10.1016/s0167-9317(01)00443-9
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Nanofabrication at a 10 nm length scale: Limits of lift-off and electroplating transfer processesJournal de Physique IV, 1999
- Magnetization Reversal in Arrays of Perpendicularly Magnetized Ultrathin Dots Coupled by Dipolar InteractionPhysical Review Letters, 1998
- Fabrication and near-room temperature transport of patterned gold cluster structuresJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Direct writing of gold nanostructures using a gold-cluster compound and a focused-ion beamJournal of Applied Physics, 1993
- Estimation of Damage Induced by Focused Ga Ion Beam IrradiationJapanese Journal of Applied Physics, 1993
- Lateral spreading of focused ion-beam-induced damageJournal of Applied Physics, 1992
- Optical study of GaAs/GaAlAs quantum structures processed by high energy focused ion beam implantationSurface Science, 1990
- Focused ion beams for lithography and direct doping in VLSI device fabricationMicroelectronic Engineering, 1986
- The influence of substrate geometry on the emission properties of a liquid metal ion sourceApplied Physics A, 1986
- A Monte Carlo calculation of the virtual source size for a liquid metal ion sourceJournal of Vacuum Science & Technology B, 1985