Control of orientation from random to (220) or (400) in polycrystalline silicon films
- 1 January 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 337 (1-2) , 18-22
- https://doi.org/10.1016/s0040-6090(98)01168-7
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology (09305002)
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