Imaging interferometric lithography: A wavelength division multiplex approach to extending optical lithography
- 1 November 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (6) , 3392-3397
- https://doi.org/10.1116/1.590465
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Imaging interferometric lithography for arbitrary patternsPublished by SPIE-Intl Soc Optical Eng ,1998
- Process development for 180-nm structures using interferometric lithography and i-line photoresistPublished by SPIE-Intl Soc Optical Eng ,1997
- Interferometric lithography exposure tool for 180-nm structuresPublished by SPIE-Intl Soc Optical Eng ,1997
- Printing Isolated Features with k 1= 0.2 Using Multiple-Pupil ExposureJapanese Journal of Applied Physics, 1996
- Can synthetic aperture techniques be applied to optical lithography?Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Multiple-exposure interferometric lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Photolithography System Using Annular IlluminationJapanese Journal of Applied Physics, 1991
- Holographic lithography with thick photoresistApplied Physics Letters, 1983
- Optical Systems with Resolving Powers Exceeding the Classical Limit*Journal of the Optical Society of America, 1966