A REVIEW OF THE CHEMICAL VAPOR DEPOSITION (CVD) OF THE REFRACTORY COMPOUNDS OF TITANIUM - A UNIQUE FAMILY OIF COATINGS
- 1 July 1993
- journal article
- review article
- Published by Taylor & Francis in Materials and Manufacturing Processes
- Vol. 8 (4-5) , 519-534
- https://doi.org/10.1080/10426919308934855
Abstract
This paper is a review of a unique family of refractory compounds comprising the boride, carbide and nitride of titanium. These materials are characterized by high hardness, high wear resistance and chemical inertness. They are obtained as coatings by chemical vapor deposition (CVD) on a variety of substrates such as tool steel, cemented carbides, graphite and many others. Promising deposition techniques are plasma-CVD and metallo-organic CVD. Major applications of these coatings are found in wear, erosion and corrosion protection and in cutting toolsKeywords
This publication has 9 references indexed in Scilit:
- Plasma‐Enhanced Chemical Vapor Deposition of TiN from TiCl4 / N 2 / H 2 Gas MixturesJournal of the Electrochemical Society, 1989
- Deposition of TiN and Ti(O,C,N) hard coatings by a plasma assisted chemical vapor deposition processJournal of Vacuum Science & Technology A, 1986
- Coatings in magnetic fusion devicesJournal of Vacuum Science & Technology A, 1986
- Effect of deposition variables on the chemical vapor deposition of TiC using propaneJournal of Vacuum Science & Technology A, 1986
- Cutting tool materials coated by chemical vapour depositionWear, 1984
- Mechanical properties of chemical vapor deposited coatings for fusion reactor applicationJournal of Vacuum Science and Technology, 1981
- The chemical vapor deposition of TiB2 from diboraneThin Solid Films, 1980
- The chemical vapor deposition of TiB2 on graphiteJournal of the Less Common Metals, 1979
- Titanium carbonitrides obtained by chemical vapor depositionThin Solid Films, 1977