Stoichiometric and Structural Origin of Electronic States at theSi-Si Interface
- 23 March 1981
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 46 (12) , 782-785
- https://doi.org/10.1103/physrevlett.46.782
Abstract
Extra Si density of states has been observed within about 3-4 Å of the Si-Si(111) interface. Spectral analysis indicated that most of these states exist near the Si band-gap region and originate from an atomic environment more Si rich than Si. Transmission-electron-microscopy lattice images showed a structurally sharp Si-Si interface with misfit dislocations and atomic-step imperfections. It is suggested that the interfacial bonding in such a structure can account for the observed interface states.
Keywords
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