Hydrogen determination in silicon nitride films by the nuclear recoil method
- 1 February 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 88 (1) , 49-54
- https://doi.org/10.1016/0040-6090(82)90349-2
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Doping Density Dependent Attachment of RhB on TiO2 ElectrodesJournal of the Electrochemical Society, 1980
- The hydrogen content of plasma-deposited silicon nitrideJournal of Applied Physics, 1978
- Chemical non-uniformity of thin dielectric films produced by ammonolysis of monosilaneThin Solid Films, 1976
- Nondestructive analysis of thin surface layers of materials for hydrogen contentAtomic Energy, 1976
- Hydrogen content and annealing of memory quality silicon-oxynitride filmsJournal of Electronic Materials, 1976