Growth and etching of silicon in chemical vapour deposition systems; The influence of thermal diffusion and temperature gradient
- 31 December 1975
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 31, 299-307
- https://doi.org/10.1016/0022-0248(75)90144-x
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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