High-performance polymer tfts printed on a plastic substrate
- 16 December 2002
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 49 (11) , 2008-2015
- https://doi.org/10.1109/ted.2002.803642
Abstract
High-performance poly (3-hexylthiophene) (P3HT) thin-film transistors array was fabricated on a plastic substrate by employing micro-contact printing process. The microcontact printing process, which uses a silicon elastomer stamp, enables the patterning of polymer layers without any photolithography process. As the gate dielectric, spun polyimide, and low-temperature ion-beam deposited silicon dioxide layers were used, forming a dual-layer structure. It is found out that the polymide layer improves the surface roughness of the dielectric and accordingly brings about enhanced device performance. Additionally, by using O 2 plasma treatment, both higher drain current and carrier mobility were obtained simultaneously. Changes in the surface states of the source-drain electrodes and the morphology of the dielectric are proposed to account for the observed improvements. Based on the experiments, we built a high-performance plastic-based P3HT transistors array including 0.02 cm 2 V ·s in carrier mobility and on/off current ratio about 10 3 ~ 10 4 .Keywords
This publication has 25 references indexed in Scilit:
- Highly reliable ultrathin silicon oxide film formation at low temperature by oxygen radical generated in high-density krypton plasmaIEEE Transactions on Electron Devices, 2001
- Very Low Temperature E-gun Evaporated Gate Oxide of TFTs on Plastic SubstratesMRS Proceedings, 2001
- Effect of preoxidation on deposition of thin gate-quality silicon oxide film at low temperature by using a sputter-type electron cyclotron resonance plasmaJournal of Applied Physics, 1997
- Stability of nitrided silicon dioxide deposited by reactive sputteringApplied Physics Letters, 1995
- High field related thin oxide wearout and breakdownIEEE Transactions on Electron Devices, 1995
- New approach to the preparation of ultrathin silicon dioxide films at low temperaturesApplied Physics Letters, 1992
- Polyimide-related design considerations in a bipolar technologyIEEE Transactions on Electron Devices, 1990
- Electrical conduction in polyimide between 20 and 350° CJournal of Electronic Materials, 1987
- Electrical conduction in polyimide filmsJournal of Applied Physics, 1986
- Sodium transport in polyimide-SiO2 systemsJournal of Electronic Materials, 1985