Hole trap levels in Mg-doped GaN grown by metalorganic vapor phase epitaxy
- 5 October 1998
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 73 (14) , 2024-2026
- https://doi.org/10.1063/1.122356
Abstract
Hole trap levels in a Mg-doped GaN grown by metalorganic vapor phase epitaxy (MOVPE) are studied with deep level transient spectroscopy (DLTS). The Mg concentration of the sample was but the hole concentration was as low as at room temperature. The DLTS spectrum has a dominant peak with activation energy of accompanied by two additional peaks with activation energies of and It was found that the dominant peak consists of five peaks, each of which has different activation energy and capture cross section. A relevant model for these levels is presented in relation to the Mg–N–H complexes.
Keywords
This publication has 7 references indexed in Scilit:
- New dopant precursors for n-type and p-type GaNJournal of Crystal Growth, 1997
- Local vibrational modes of the Mg–H acceptor complex in GaNApplied Physics Letters, 1996
- Hydrogen in GaNMRS Proceedings, 1995
- Characterization of the Shallow and Deep Levels in Si Doped GaN Grown by Metal-Organic Vapor Phase EpitaxyJapanese Journal of Applied Physics, 1994
- Hole Compensation Mechanism of P-Type GaN FilmsJapanese Journal of Applied Physics, 1992
- Growth and Luminescence Properties of Mg‐Doped GaN Prepared by MOVPEJournal of the Electrochemical Society, 1990
- Deep levels in InxGa1-xAsyP1-ygrown on (100) GaAs by LPESemiconductor Science and Technology, 1989