Nanoscale patterning using self-assembled polymers for semiconductor applications
- 1 November 2001
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 19 (6) , 2784-2788
- https://doi.org/10.1116/1.1421551
Abstract
Thin films of self-organizing diblock copolymers may be suitable for semiconductor applications since they enable patterning of ordered domains with dimensions below photolithographic resolution over wafer-scale areas. We investigate the process window for forming ordered arrays of nanoscale polymer domains in thin films across 8-in.-diam silicon wafers, including the effect of substrate material and surface treatment, annealing conditions, copolymer molecular weight, and film thickness. We also demonstrate pattern transfer of the nanoporous polymer template using both reactive ion etching and metal lift off.Keywords
This publication has 15 references indexed in Scilit:
- Guided Self-Assembly of Symmetric Diblock Copolymer Films on Chemically Nanopatterned SubstratesMacromolecules, 2000
- PREVAIL: IBM's e-beam technology for next generation lithographyPublished by SPIE-Intl Soc Optical Eng ,2000
- Nanoscopic Templates from Oriented Block Copolymer FilmsAdvanced Materials, 2000
- Cost analysis on the next-generation lithography technologyPublished by SPIE-Intl Soc Optical Eng ,1999
- Block Copolymers—Designer Soft MaterialsPhysics Today, 1999
- Extreme ultraviolet lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Next generation lithographyMaterials Science in Semiconductor Processing, 1998
- Controlling Polymer-Surface Interactions with Random Copolymer BrushesScience, 1997
- Structure of minimum thickness and terraced free-standing films of block copolymersJournal of Polymer Science Part B: Polymer Physics, 1996
- Local Control of Microdomain Orientation in Diblock Copolymer Thin Films with Electric FieldsScience, 1996