Mass spectrometry and diamond growth from gas mixtures
- 31 March 1997
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 6 (2-4) , 490-493
- https://doi.org/10.1016/s0925-9635(96)00639-5
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Diamond deposition from fluorinated precursors using microwave-plasma chemical vapor depositionApplied Physics Letters, 1995
- Diamond growth on carbide surfaces using a selective etching techniqueJournal of Materials Research, 1994
- Low-temperature deposition of diamond using chloromethane in a hot-filament chemical vapor deposition reactorDiamond and Related Materials, 1993
- Methyl halides as carbon sources in a hot-filament diamond CVD reactor: A new gas phase growth speciesJournal of Materials Research, 1993
- Diamond deposition from CF4-H2 mixed gas by microwave plasmaApplied Physics Letters, 1992
- Direct observation of chemical vapor deposited diamond films by atomic force microscopyApplied Physics Letters, 1992
- Direct deposition of polycrystalline diamond films on Si(100) without surface pretreatmentApplied Physics Letters, 1991