Influence of Co60 γ-rays on dc performance of AlGaN/GaN high electron mobility transistors
- 25 January 2002
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 80 (4) , 604-606
- https://doi.org/10.1063/1.1445809
Abstract
AlGaN/GaN high electron mobility transistors (HEMTs) with different gate length and widths were irradiated with γ-rays to doses up to 600 Mrad. Little measurable change in dc performance of the devices was observed for doses lower than 300 Mrad. At the maximum dose employed, the forward gate current was significantly decreased, with an accompanying increase in reverse breakdown voltage. This is consistent with a decrease in effective carrier density in the channel as a result of the introduction of deep electron trapping states. The threshold voltage shifted to more negative voltages as a result of the irradiation, while the magnitude of the drain–source current was relatively unaffected. This is consistent with a strong increase of trap density in the material. The magnitude of the decrease in transconductance of the AlGaN/GaN HEMTs is roughly comparable to the decrease in dc current gain observed in InGaP/GaAs heterojunction bipolar transistors irradiated under similar conditions.
This publication has 18 references indexed in Scilit:
- An insulator-lined silicon substrate-via technology with high aspect ratioIEEE Transactions on Electron Devices, 2001
- Very-high power density AlGaN/GaN HEMTsIEEE Transactions on Electron Devices, 2001
- Trapping effects and microwave power performance in AlGaN/GaN HEMTsIEEE Transactions on Electron Devices, 2001
- Undoped AlGaN/GaN HEMTs for microwave power amplificationIEEE Transactions on Electron Devices, 2001
- Minority electron transport anisotropy in p-type Al/sub x/Ga/sub 1-x/N/GaN superlatticesIEEE Transactions on Electron Devices, 2001
- 7.5 kW/mm 2 current switch using AlGaN/GaNmetal-oxide-semiconductor heterostructure field effect transistors on SiC substratesElectronics Letters, 2000
- Annealing behavior of a proton irradiated Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistor grown by MBEIEEE Transactions on Electron Devices, 2000
- Polarization effects in nitride semiconductor device structures and performance of modulation doped field effect transistorsSolid-State Electronics, 1999
- Drain current compression in GaN MODFETs underlarge-signalmodulation at microwave frequenciesElectronics Letters, 1999
- Recessed gate GaN MODFETsSolid-State Electronics, 1997