Channeling phenomena in off-axis ion implanted (001) silicon
- 1 September 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 12 (2) , 225-228
- https://doi.org/10.1016/0168-583x(85)90055-2
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Channeling of ions near the silicon 〈001〉 axisApplied Physics Letters, 1985
- Effect of diffuse scattering in the strain profile determination by double crystal X-ray diffractionPhysica Status Solidi (a), 1985
- Planar channeling in ion-implated siliconPhysica Status Solidi (a), 1974