Formation of Sn nanocrystals in thin SiO2 film using low-energy ion implantation
- 22 December 1997
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 71 (25) , 3652-3654
- https://doi.org/10.1063/1.120470
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Coulomb blockade at 77 K in nanoscale metallic islands in a lateral nanostructureApplied Physics Letters, 1995
- Isolated Nanometer-Size Si Dot Arrays Fabricated Using Electron-Beam Lithography, Reactive Ion Etching, and Wet Etching in NH4OH/H2O2/H2OJapanese Journal of Applied Physics, 1994
- Colloid size distributions in ion implanted glassJournal of Non-Crystalline Solids, 1993
- Laser-induced fluorescence and nonlinear optical properties of ion-implanted fused silicaNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Au+-Ion-Implanted Silica Glass with Non-Linear Optical PropertyJapanese Journal of Applied Physics, 1991
- Formation of oxygen-deficient type structural defects and state of ions in SiO2 glasses implanted with transition metal ionsJournal of Non-Crystalline Solids, 1990
- The optical kerr effect in small metal particles and metal colloids: The case of goldApplied Physics A, 1988
- Precipitation phenomena in high-dose iron-implanted silica and annealing behaviorJournal of Materials Research, 1987
- High-Resolution X-Ray Photoelectron Spectroscopy as a Probe of Local Atomic Structure: Application to Amorphous Siand the Si-SiInterfacePhysical Review Letters, 1979
- Aggregation and migration of ion-implanted silver in lithia-alumina-silica glassJournal of Applied Physics, 1977