Isolated Nanometer-Size Si Dot Arrays Fabricated Using Electron-Beam Lithography, Reactive Ion Etching, and Wet Etching in NH4OH/H2O2/H2O
- 1 December 1994
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 33 (12B) , L1796
- https://doi.org/10.1143/jjap.33.l1796
Abstract
No abstract availableKeywords
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