Soft x-ray analysis system for reflection, secondary electron, and fluorescence spectroscopy

1 July 1989

journal article
research article
Published by AIP Publishing in Review of Scientific Instruments

Vol. 60 (7) , 2219-2222
https://doi.org/10.1063/1.1140774

Abstract

This article describes an UHV compatable soft x‐ray analysis system for reflection, secondary electron, and fluorescence spectroscopy. It is equipped with a reflectometer with an angular accuracy of 0.01°. This is achieved with rotary encoders directly coupled to the rotation axes. At the same time, the system is equipped with an electron multiplier, a cylindrical mirror analyzer, and a Si(Li) detector, each for measuring total secondary electrons, photo‐ and Auger electrons, and fluorescence. Furthermore, it is possible to form multilayer films and analyze them in situ. The performance of the reflectometer has been tested on the beamline BL‐8A at the Photon Factory. We present the results of reflectivity measurements for diamond‐cut copper mirrors and Langmuir–Blodgett films.

Keywords

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