Influence of Ti-content in the bottom electrodes on the ferroelectric properties of SrBi2Ta2O9(SBT)
- 1 September 1997
- journal article
- Published by Taylor & Francis in Integrated Ferroelectrics
- Vol. 17 (1-4) , 421-432
- https://doi.org/10.1080/10584589708013016
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- In-situ sputter deposition of PT and PZT films on Platinum and RuO2 electrodesMicroelectronic Engineering, 1995
- Investigation of Pt/Ti bilayer metallization on silicon for ferroelectric thin film integrationJournal of Applied Physics, 1994
- Investigation of Pt Bottom Electrodes for "In-Situ" Deposited Pb(Zr,Ti)O3 (PZT) thin FilmsMRS Proceedings, 1991