Application of the rapid thermal process: sintering the sputtered aluminum/silicon contact in silicon detector fabrication
- 1 August 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Nuclear Science
- Vol. 39 (4) , 558-562
- https://doi.org/10.1109/23.159665
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High reliable Al-Si alloy/Si contacts by rapid thermal sinteringPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Gettering in high resistive float zone silicon wafers for silicon detector applicationsIEEE Transactions on Nuclear Science, 1989
- Characteristics of Fast Surface States Associated with SiO[sub 2]-Si and Si[sub 3]N[sub 4]-SiO[sub 2]-Si StructuresJournal of the Electrochemical Society, 1969