X-RAY DYNAMICAL DIFFRACTION EFFECTS OF OXIDE FILMS ON SILICON SUBSTRATES
- 1 July 1968
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 13 (1) , 40-42
- https://doi.org/10.1063/1.1652450
Abstract
X‐ray dynamical diffraction effects due to thin oxide films on silicon substrates have been examined. Contraction of Pendellösung fringes have been observed in x‐ray topographs, due to strains introduced by the oxide film. Using the dynamical theory of x rays in distorted crystals described in the following Letter, we have been able to compute the stress in the oxide from the position of the fringes introduced by distortion.Keywords
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