Localized versus itinerant electrons at the metal-insulator transition in Si:P
- 7 August 1989
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 63 (6) , 648-651
- https://doi.org/10.1103/physrevlett.63.648
Abstract
The specific heat C of uncompensated phosphorus-doped silicon with P concentration N between 0.34 and 7.3× , i.e., in the vicinity of the metal-insulator transition, has been measured over a large range of temperature (0.04 K≤T≤3 K), allowing the unambiguous detection of an anomalous contribution ΔC∼, with α becoming negative for small N. This is attributed to exchange-coupled clusters. The magnetic-field dependence of C (up to 5.7 T) allows us to deduce the relative contributions of localized and delocalized electrons and gives evidence for interactions and correlations between these.
Keywords
This publication has 17 references indexed in Scilit:
- Thermodynamic Behavior near a Metal-Insulator TransitionPhysical Review Letters, 1988
- Critical exponent of the metal-insulator transitionPhilosophical Magazine Part B, 1985
- Metal-insulator transition in a doped semiconductorPhysical Review B, 1983
- Stress Tuning of the Metal-Insulator Transition at Millikelvin TemperaturesPhysical Review Letters, 1982
- Scaling Studies of Highly Disordered Spin-½ Antiferromagnetic SystemsPhysical Review Letters, 1982
- Resistivity‐Dopant Density Relationship for Phosphorus‐Doped SiliconJournal of the Electrochemical Society, 1980
- Magnetic field dependence of the specific heat of heavily phosphorus doped siliconSolid State Communications, 1979
- Specific heat study of heavily P doped SiSolid State Communications, 1977
- Relationship between resistivity and phosphorus concentration in siliconJournal of Applied Physics, 1974
- Specific-heat studies of heavily doped Si:PPhysical Review B, 1974