Oberflächenpräparation für die Si-Molekularstrahlepitaxie (MBE)
- 1 January 1987
- journal article
- Published by Springer Nature in Analytical and Bioanalytical Chemistry
- Vol. 329 (2) , 390
- https://doi.org/10.1007/bf00469178
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Surface chemistry of HF passivated silicon: X-ray photoelectron and ion scattering spectroscopy resultsJournal of Applied Physics, 1986
- Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopyApplied Physics A, 1986
- Oxide Growth on Etched Silicon in Air at Room TemperatureJournal of the Electrochemical Society, 1975