Pure and mixed titanium, niobium and vanadium as sputtered thick and thin films: Crystallographic properties and phase transitions between 300 and 1800 K II: Electron microscopy investigations of thin films
- 1 May 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 187 (1) , 39-50
- https://doi.org/10.1016/0040-6090(90)90108-p
Abstract
No abstract availableKeywords
This publication has 29 references indexed in Scilit:
- Pure and mixed titanium, niobium and vanadium oxides as sputtered thick and thin films: Crystallographic properties and phase transitions between 300 and 1800 K I: X-ray diffraction investigations of thick filmsThin Solid Films, 1990
- Electron beam impact: a new route to unusual stoichiometry and rare earth intermediate oxidesInorganica Chimica Acta, 1987
- HREM study of crystalline and amorphous regions of a TiO2 thin layer: Modification of the lattice parameter inside small clustersPhysica Status Solidi (a), 1986
- On the Polymorphism of Titanium Dioxide Films Crystallized by Electron Beam HeatingJapanese Journal of Applied Physics, 1986
- Real-time monitoring of crystallization and structural transformation of titania films with Raman spectroscopyOptics Letters, 1985
- Étude du comportement du niobium sous vide par diffraction des rayons X à haute températureJournal of the Less Common Metals, 1982
- Rare earth metals, rare earth hydrides, and rare earth oxides as thin films a critical reviewPhysica Status Solidi (a), 1980
- Preparation of suboxides in the Ti-O system by reactive sputteringThin Solid Films, 1977
- Structure des Oxydes de Niobium: Transformation de Structure du Nb2O5-γ en Nb2O5-α et la Formation du NbO2Japanese Journal of Applied Physics, 1965
- Structures des Oxydes de NiobiumJapanese Journal of Applied Physics, 1963