Preparation of suboxides in the Ti-O system by reactive sputtering
- 1 January 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 40, 375-383
- https://doi.org/10.1016/0040-6090(77)90139-0
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Effect of target oxidation on reactive sputtering rates of titanium in argon-oxygen plasmasThin Solid Films, 1976
- Kinetics of the Reactive Sputter Deposition of Titanium OxidesJournal of the Electrochemical Society, 1976
- Oxidation of lead films by rf sputter etching in an oxygen plasmaJournal of Applied Physics, 1974
- Reactive sputtering of metals in oxidizing atmospheresThin Solid Films, 1973
- Growth of titanium oxide crystals of controlled stoichiometry and orderJournal of Crystal Growth, 1972
- Phénomènes de pulvérisation et de distribution en profondeur. Partie IV. Pulvérisation cathodique des oxydes Nb2O5, Ta2O5 et WO3Canadian Journal of Physics, 1970
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Reinvestigation of the Phase Diagram for the System Titanium–OxygenJournal of the American Ceramic Society, 1966
- Theoretical aspects of cathode sputtering in the energy range of 5–25 keVPhysica, 1960