Thin-film tantalum-nitride resistor technology for phosphide-based optoelectronics
- 1 December 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 290-291, 513-517
- https://doi.org/10.1016/s0040-6090(06)08966-8
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- The STIC Technology-A Monolithic Approach for Combining Tantalum and Silicon TechnologiesIEEE Transactions on Components, Hybrids, and Manufacturing Technology, 1981
- Determination of the Relative Nitrogen Doping Level of Tantalum Nitride Resistor Film by Means of the Seebeck EffectIEEE Transactions on Parts, Hybrids, and Packaging, 1972