On the nature and energy distribution of defect states caused by hot electrons in Si
- 1 October 1987
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 30 (1-4) , 319-324
- https://doi.org/10.1016/0169-4332(87)90108-5
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Hot-electron-induced interface state generation in n-channel MOSFET's at 77 KIEEE Transactions on Electron Devices, 1987
- Profiling of stress induced interface states in short channel MOSFETs using a composite charge pumping techniqueSolid-State Electronics, 1986
- Semi-empirical equations for electron velocity in silicon: Part I—BulkIEEE Transactions on Electron Devices, 1983
- Generation of interface states by hot hole injection in MOSFET'sIEEE Transactions on Electron Devices, 1982
- Threshold-voltage instability in MOSFET's due to channel hot-hole emissionIEEE Transactions on Electron Devices, 1981