Chemical Vapor Deposition of Phosphorus Nitride and Related Compounds
- 1 August 1984
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 23 (8R)
- https://doi.org/10.1143/jjap.23.1157
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Chemical Vapor Deposition of Insulating Films using Nitrogen TrifluorideJapanese Journal of Applied Physics, 1984
- Chemical vapor deposition and characterization of phosphorus nitride (P3N5) gate insulators for InP metal-insulator-semiconductor devicesJournal of Applied Physics, 1982
- Reduction of Interface States and Fabrication of p-Channel Inversion-Type InP-MISFETJapanese Journal of Applied Physics, 1980