Thermal and flow issues in the design of metalorganic chemical vapor deposition reactors
- 1 December 1994
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 145 (1-4) , 642-649
- https://doi.org/10.1016/0022-0248(94)91120-7
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
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