Model of structural transformations on the chemically etched silicon surface during thermal oxidation
- 16 July 1978
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 48 (1) , 199-202
- https://doi.org/10.1002/pssa.2210480125
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Low Temperature Oxidation of Silicon Studied by Photosensitive ESR and Auger Electron SpectroscopyJournal of the Electrochemical Society, 1976
- Investigation of passivation mechanism in silicon surfaces by electron spin resonanceSurface Science, 1973
- Formation of Ultrathin Oxide Films on SiliconJournal of the Electrochemical Society, 1972
- Thin Tunnelable Layers of Silicon Dioxide Formed by Oxidation of SiliconJournal of the Electrochemical Society, 1970