Structure and properties of coatings composed of TiN-Ti obtained by the reactive pulse plasma method
- 1 June 1984
- journal article
- Published by Springer Nature in Journal of Materials Science Letters
- Vol. 3 (6) , 505-508
- https://doi.org/10.1007/bf00720984
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Reactive pulse plasma crystallization of TiN layers on substrates at 500 KJournal of Crystal Growth, 1983
- Microstructure of Si3N4-TiN composites prepared by chemical-vapour depositionJournal of Materials Science, 1982
- The deposition of thin films of materials with high melting points on substrates at room temperature using the pulse plasma methodThin Solid Films, 1981
- Microstructures of TiN and Ti2N deposits prepared by activated reactive evaporationThin Solid Films, 1979
- Selective Studies of Chemical Vapor‐Deposited Aluminum Nitride‐Silicon Nitride Mixture FilmsJournal of the Electrochemical Society, 1978
- Structure of TiC-Ni coatings synthesized by activated reactive evaporationThin Solid Films, 1977
- Chemical vapor deposition in the systems silicon-carbon and silicon-carbon-nitrogenJournal of the Less Common Metals, 1974