X-ray Lithography: Novel Fabrication Process for SiC/W Steppermasks
- 1 November 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (11R)
- https://doi.org/10.1143/jjap.28.2342
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Low Distortion X-Ray Mask With W-Ti AbsorberPublished by SPIE-Intl Soc Optical Eng ,1988
- X-ray lithographyJournal of Vacuum Science & Technology B, 1988
- Improved tungsten absorber technology for sub-half-micron x-ray lithographyMicroelectronic Engineering, 1987
- Status And Prospects Of Sic-Masks For Synchrotron Based X-Ray LithographyPublished by SPIE-Intl Soc Optical Eng ,1987