Improvement of asymmetrical characteristics in submicron CMOS devices
- 1 January 1990
- journal article
- research article
- Published by Wiley in Electronics and Communications in Japan (Part II: Electronics)
- Vol. 73 (3) , 51-58
- https://doi.org/10.1002/ecjb.4420730306
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- A 16mb Dram with an Open Bit-Line ArchitecturePublished by Institute of Electrical and Electronics Engineers (IEEE) ,1988
- The Improvement of LDD MOSFET's Characteristics by the Oblique-Rotating Ion ImplantationPublished by Japan Society of Applied Physics ,1987
- A new half-micrometer p-channel MOSFET with efficient punchthrough stopsIEEE Transactions on Electron Devices, 1986
- Analysis of LDD transistor asymmetry susceptibility in VLSI circuitsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1985
- A new degradation mechanism of current drivability and reliability of asymmetrical LDDMOSFET'sPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1985
- Hot carrier degradation modes and optimization of LDD MOSFETsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1984