Optimization of Process Parameter and Temperature Uniformity On Wafers For Rapid Thermal Processing

This publication has 8 references indexed in Scilit:

• A 3-Dimensional Temperature Uniformity Model for a Rapid Thermal Processing Furnace
  MRS Proceedings, 1994
• RTP Modeling for CVD and Thermal Oxidation
  MRS Proceedings, 1994
• Three-Dimensional Asymmetrical Modeling of Rapid Thermal Annealing of Silicon Wafers
  MRS Proceedings, 1994
• Modelling of Temperature Distribution of Semiconductors During Rapid Thermal Processing
  MRS Proceedings, 1994
• New lamp arrangement for rapid thermal processing
  Applied Surface Science, 1993
• Rapid Thermal Processor Modeling, Control, and Design for Temperature Uniformity
  MRS Proceedings, 1993
• Is There a Way to a Perfect Rapid Thermal Processing System?
  MRS Proceedings, 1991
• Kinetics of Rapid Thermal Oxidation of Silicon
  MRS Proceedings, 1987