Target profile change during magnetron sputtering
- 1 June 1986
- Vol. 36 (6) , 307-309
- https://doi.org/10.1016/0042-207x(86)90009-6
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- The characteristics of a planar magnetron operated at a high power inputThin Solid Films, 1981
- Substrate heating in cylindrical magnetron sputtering sourcesThin Solid Films, 1978
- The effect of gettering on the reflectivity of aluminium filmsBritish Journal of Applied Physics, 1958
- The continuous evaporation of aluminium in vacuumVacuum, 1956
- The Effect of Vapor Incidence on the Structure of Evaporated Aluminum Films*Journal of the Optical Society of America, 1953