Comparative studies between the growth characteristics of Bi2Te3 thin films deposited on SiO2, Si(100) and Si(111)
- 1 September 1996
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 167 (1-2) , 122-128
- https://doi.org/10.1016/0022-0248(96)00247-3
Abstract
No abstract availableKeywords
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