Negative-ion source for implantation and surface interaction of negative-ion beams (invited)
- 1 April 1994
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 65 (4) , 1290-1294
- https://doi.org/10.1063/1.1144984
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Carbon negative ion implantation into siliconNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1993
- Negative ion beam technology for materials science (invited)Review of Scientific Instruments, 1992
- Electron detachment cross-sections for heavy negative-ion beamNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- A heavy negative ion sputter source: Production mechanism of negative ions and their applicationsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Mass-separated negative-ion-beam deposition systemReview of Scientific Instruments, 1986