Microstructure and growth rate of chemical vapour deposited TiN films in a vertical cold wall reactor
- 1 June 1993
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 130 (3-4) , 578-586
- https://doi.org/10.1016/0022-0248(93)90547-a
Abstract
No abstract availableKeywords
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