Effects of the experimental conditions of chemical vapour deposition on a TiC/TiN double-layer coating
- 1 September 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 107 (2) , 129-139
- https://doi.org/10.1016/0040-6090(83)90015-9
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Study of growth rate and failure mode of chemically vapour deposited TiN, TiCxNy and TiC on cemented tungsten carbideJournal of Materials Science, 1982
- TiCxNy and TiCx-TiN films obtained by CVD in an ultrasonic fieldJournal of Materials Science, 1979
- Machining evaluation of cemented carbide tools coated with HfN and TiC by the activated reactive evaporation processThin Solid Films, 1978
- Analysis of the Chemical Vapor Deposition of Titanium Diboride: II . Modeling the Kinetics of DepositionJournal of the Electrochemical Society, 1977
- Gasphasenepitaxie von titankarbid, titannitrid und titankarbonitridJournal of the Less Common Metals, 1977
- Chemical Vapor Deposition of Titanium Nitride on Cemented CarbidesJournal of the Japan Institute of Metals and Materials, 1977
- Structure and Strength Effects in CVD Titanium Carbide and Titanium Nitride CoatingsJournal of the Electrochemical Society, 1976
- Chemical Vapor Deposition of a TiC Coating on a Cemented-Carbide Cutting ToolJournal of the Electrochemical Society, 1973
- Vapour-phase crystallization and some physical properties of titanium nitrideJournal of the Less Common Metals, 1971