A photoemission study of H2O adsorption on a vicinal Si(100) surface
- 31 December 1988
- Vol. 38 (4-5) , 251-255
- https://doi.org/10.1016/0042-207x(88)90055-3
Abstract
No abstract availableThis publication has 29 references indexed in Scilit:
- Adsorption of H2O on planar and stepped Si(100): Structural aspectsJournal of Vacuum Science & Technology A, 1987
- Evidence of dissociation of water on the Si(100)2 × 1 surfacePhysical Review B, 1984
- Chemisorption ofO on Si(100)Physical Review B, 1983
- Chemisorption of O on the surface of : Role of electrons and ligand geometryPhysical Review B, 1982
- Photon-stimulated desorption and ultraviolet photoemission spectroscopic study of the interaction ofO with a Ti(001) surfacePhysical Review B, 1982
- Reconstruction of Semiconductor Surfaces: Buckling, Ionicity, and-Bonded ChainsPhysical Review Letters, 1982
- Photoemission studies of surface core‐level shifts and their applicationsJournal of Vacuum Science and Technology, 1982
- Experimental studies of the dangling- and dimer-bond-related surface electron bands on Si(100) (2×1)Physical Review B, 1981
- Identification of an Adsorbed Hydroxyl Species on the Pt(111) SurfacePhysical Review Letters, 1980
- Calculated photoionization cross sections and relative experimental photoionization intensities for a selection of small moleculesThe Journal of Chemical Physics, 1974