Residual stresses and debonding of diamond films on titanium alloy substrates
- 1 May 1996
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 5 (6-8) , 674-681
- https://doi.org/10.1016/0925-9635(95)00431-9
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
- Internal stresses in CVD diamond layersDiamond and Related Materials, 1994
- Internal stress analysis in diamond films formed by d.c. plasma chemical vapour depositionThin Solid Films, 1992
- Studies of stress related issues in microwave CVD diamond on 〈100〉 silicon substratesThin Solid Films, 1992
- Strain in CVD diamond films: effects of deposition variablesThin Solid Films, 1992
- Evaluation of internal stresses present in chemical vapor deposition diamond filmsSurface and Coatings Technology, 1991
- Growth and properties of diamond films prepared by microwave plasma chemical vapour deposition using different oxygen-containing source gasesSurface and Coatings Technology, 1991
- Measurement of crystalline strain and orientation in diamond films grown by chemical vapor depositionJournal of Materials Research, 1990
- Characterization of crystalline quality of diamond films by Raman spectroscopyApplied Physics Letters, 1989
- Stress-related effects in thin filmsThin Solid Films, 1989
- Stresses in thin films: The relevance of grain boundaries and impuritiesThin Solid Films, 1976