Room‐Temperature, Low‐Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers
- 24 May 2005
- journal article
- research article
- Published by Wiley in Advanced Materials
- Vol. 17 (11) , 1419-1424
- https://doi.org/10.1002/adma.200401192
Abstract
A new UV‐curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV‐assisted nanoimprint lithography. Uniform films with thicknesses ranging from below 50 nm to over 1 μm can be easily spin‐coated using a suitable undercoating layer on a substrate. Patterns with feature sizes ranging from tens of micrometers to 20 nm (see Figure) are imprinted at room temperature with a pressure of less than 0.1 MPa.Keywords
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