The effect of reactant gas composition on the plasmaenhanced chemical vapour deposition of TiN
- 1 February 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 169 (1) , 57-68
- https://doi.org/10.1016/s0040-6090(89)80005-7
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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