In-Situ Fabrication and Process Control Techniques in Rapid Thermal Processing
- 1 January 1991
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Integrated rapid isothermal processingPublished by SPIE-Intl Soc Optical Eng ,1991
- A model for rapid thermal processing: achieving uniformity through lamp controlIEEE Transactions on Semiconductor Manufacturing, 1991
- Process uniformity and slip dislocation patterns in linearly ramped-temperature transient rapid thermal processing of siliconIEEE Transactions on Semiconductor Manufacturing, 1989
- Pyrometric Emissivity Measurements and Compensation in an RTP ChamberMRS Proceedings, 1989
- Interfacial and breakdown characteristics of MOS devices with rapidly grown ultrathin SiO2gate insulatorsIEEE Transactions on Electron Devices, 1987
- Structure of LPCVD Tungsten Films for IC ApplicationsJournal of the Electrochemical Society, 1986
- Spectral Emissivity of SiliconJapanese Journal of Applied Physics, 1967