A model for rapid thermal processing: achieving uniformity through lamp control
- 1 January 1991
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Semiconductor Manufacturing
- Vol. 4 (1) , 9-13
- https://doi.org/10.1109/66.75858
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- A global model for rapid thermal processorsIEEE Transactions on Semiconductor Manufacturing, 1990
- Thermal and stress analysis of semiconductor wafers in a rapid thermal processing ovenIEEE Transactions on Semiconductor Manufacturing, 1988
- In-Situ Processing of Silicon Dielectrics by Rapid Thermal Processing: Cleaning, Growth, and AnnealingMRS Proceedings, 1987
- Rapid thermal processing of thin gate dielectrics. Oxidation of siliconIEEE Electron Device Letters, 1985
- Process Control for a Rapid Optical Annealing SystemMRS Proceedings, 1985