The formation of titanium, chromium, niobium and zirconium aluminides in thin films for interconnections
- 1 June 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 149 (3) , 269-282
- https://doi.org/10.1016/0040-6090(87)90390-7
Abstract
No abstract availableKeywords
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