Preparation of Ta/Mo structure by using RF-Dc coupled magnetron sputtering
- 1 January 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 312 (1-2) , 135-138
- https://doi.org/10.1016/s0040-6090(97)00727-x
Abstract
No abstract availableKeywords
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