Substrate bias effects on low temperature polycrystalline silicon formation using electron cyclotron resonance SiH4/H2 plasma
- 15 June 1997
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 81 (12) , 8035-8039
- https://doi.org/10.1063/1.365408
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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