Cathodic deposition of amorphous silicon from solutions of silicic acid and tetraethyl ortho-silicate in ethylene glycol and formamide containing HF
- 31 March 1982
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 27 (3) , 371-377
- https://doi.org/10.1016/0013-4686(82)85009-3
Abstract
No abstract availableKeywords
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