Preparation of Rutile TiO2Films by RF Magnetron Sputtering
- 1 September 1995
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 34 (9R)
- https://doi.org/10.1143/jjap.34.4950
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Growth of TiO2 Rutile Films at Low Temperature by Reactive Sputtering.SHINKU, 1994
- Formation of Titania Films by Ion Dynamic Mixing.SHINKU, 1992
- Spectroscopic Measurements of the Production and the Transport of CH Radicals in a Methane Plasma Used for the CVD of a-C:HJapanese Journal of Applied Physics, 1990
- Comparison of the properties of titanium dioxide films prepared by various techniquesApplied Optics, 1989
- Ion-based methods for optical thin film depositionJournal of Materials Science, 1986
- Determination of the thickness and optical constants of amorphous siliconJournal of Physics E: Scientific Instruments, 1983
- Structural properties of titanium dioxide films deposited in an rf glow dischargeJournal of Vacuum Science & Technology A, 1983
- Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputteringThin Solid Films, 1981
- Preparation of suboxides in the Ti-O system by reactive sputteringThin Solid Films, 1977
- Refractive indices of TiO_2 films produced by reactive evaporation of various titanium–oxygen phasesApplied Optics, 1976