Generating ∼90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask
- 1 January 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (1) , 59-68
- https://doi.org/10.1116/1.589836
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Non-critically phase-matched cascaded THG at 440 nm in KTiOP1−yAsyO4 crystalsOptics Communications, 1995
- Multiwavelength distributed Bragg reflector laser array fabricated using near field holographic printing with an electron-beam generated phase grating maskJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Features of gold having micrometer to centimeter dimensions can be formed through a combination of stamping with an elastomeric stamp and an alkanethiol ‘‘ink’’ followed by chemical etchingApplied Physics Letters, 1993
- Single-excimer-pulse writing of fiber gratings by use of a zero-order nulled phase mask: grating spectral response and visualization of index perturbationsOptics Letters, 1993
- Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase maskApplied Physics Letters, 1993
- Characterization of near-field holography grating masks for optoelectronics fabricated by electron beam lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Fabrication of grooved glass substrates by phase mask lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- A Novel Optical Lithography Technique Using the Phase-Shifter FringeJapanese Journal of Applied Physics, 1991
- Photolithographic Contact Printing of 4000Å Linewidth PatternsJournal of the Electrochemical Society, 1974